99.7% CHROMIUM TARGET
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  • Parts 1
  • Time <5 mins
Ongoing, First published Aug 13, 2024
https://www.aulistermetal.com/products/99.7-chromium-target.html


99.7% CHROMIUM TARGET
99.7% chromium target is a 99.7% pure chromium material commonly used in thin film preparation techniques such as physical evaporation deposition (PVD) or magnetron sputtering. A target is a material used to deposit a thin film by placing the target in a vacuum chamber, bombarding the surface of the target with high-energy particles to vaporize or sputter the material, and then depositing it on the substrate to form a thin film. The 99.7% chromium sputtering target has a high purity chromium material that can be used to prepare chromium films with specific properties and special application requirements.
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